Testing of optical materials for 193-nm applications

Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Andrew Grenville; Allen Keith Bates; Chris K. Van Peski

doi:10.1117/12.328512

27 October 1998 Testing of optical materials for 193-nm applications

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen Keith Bates, Chris K. Van Peski

Author Affiliations +

Proceedings Volume 3427, Optical Systems Contamination and Degradation; (1998) https://doi.org/10.1117/12.328512
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We present an assessment of bulk fused silica and calcium fluoride, and of antireflective coatings for 193-nm lithographic applications. In the course of extensive marathon studies we have accumulated 1-5 billion laser pulses on over 100 bulk material samples at fluences from 0.2 to 4 mJ/cm²/pulse. The result show large variation in both initial and induced absorption of fused silica and in densification of fused silica. For antireflective coatings, there are samples that undergo no appreciable degradation when irradiated for > 1 billion pulses at 15 mJ/cm²/pulse. However, initial losses in some coatings may be unacceptably high for lithographic applications.

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Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen Keith Bates, and Chris K. Van Peski "Testing of optical materials for 193-nm applications", Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); https://doi.org/10.1117/12.328512

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