Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics

Masahito Niibe; Atsushi Miyafuji; Hiroo Kinoshita; Takeo Watanabe; Shozo Inoue; Keiji Koterazawa

doi:10.1117/12.331127

13 November 1998 Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics

Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, Takeo Watanabe, Shozo Inoue, Keiji Koterazawa

Proceedings Volume 3447, Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications; (1998) https://doi.org/10.1117/12.331127
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We report a progress in the aspherization of precision of optical surface by deposition of graded-thickness films onto spherical substrate. As a deposition film, we examined single layer and multilayer film. Mo/Si multilayer had small stress and small surface roughness up to the total film thickness of 1 micrometers , and is suitable for the thin film to fabricate mirrors in the EUVL camera. We demonstrate an aspherical mirror fabrication using mask deposition technique. The result shows good agreement between the measured and desired thickness profiles.

Citation Download Citation

Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, Takeo Watanabe, Shozo Inoue, and Keiji Koterazawa "Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics", Proc. SPIE 3447, Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications, (13 November 1998); https://doi.org/10.1117/12.331127

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