Translator Disclaimer
Paper
22 May 1998 Transmission polarizing beam-splitter grating for reconfigurable optical interconnects
Author Affiliations +
Proceedings Volume 3490, Optics in Computing '98; (1998) https://doi.org/10.1117/12.308875
Event: Optics in Computing '98, 1998, Bruges, Belgium
Abstract
We present the design, fabrication, and test of a 90 degree(s) polarizing beam splitter grating for 633 nm. This component is compact and its fabrication is reproducible enough to be integrated in optical reconfigurable interconnect systems. For TE polarization, the incident beam is undeflected whereas TM beams exhibit a 90 degrees deviation. We used electromagnetic vector theory to optimize diffraction efficiencies and the extinction ratio. We employed direct electron beam writing and reactive ion etching to fabricate a polarizing beam splitter etched in a photoresist layer deposited on a fused silica substrate.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerome Hazart, Philippe Lalanne, Pierre H. Chavel, Edmond Cambril, and Huguette Launois "Transmission polarizing beam-splitter grating for reconfigurable optical interconnects", Proc. SPIE 3490, Optics in Computing '98, (22 May 1998); https://doi.org/10.1117/12.308875
PROCEEDINGS
4 PAGES


SHARE
Advertisement
Advertisement
Back to Top