Laser formation of titanium nitride films as a result of Ti coating modification in a nitrogen atmosphere

Sergei Eskin

doi:10.1117/12.328619

4 December 1998 Laser formation of titanium nitride films as a result of Ti coating modification in a nitrogen atmosphere

Sergei Eskin

Author Affiliations +

Proceedings Volume 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications; (1998) https://doi.org/10.1117/12.328619
Event: 1998 International Conference on Applications of Photonic Technology, 1998, Ottawa, Canada

Abstract

Laser treatment of the 303 and 416 stainless steels with Ti precoating was studied. CW CO₂ and UV ArF excimer lasers were used. The TiN films were formed at a treatment velocity of 0.5 to 3 - 5 cm/sec and a power density of CO₂ laser at (3 - 5) 10⁴ W/cm². X-ray diffractometry, x-ray mapping and Auger electron spectroscopy techniques indicated a TiN phase on the surface with oxygen content 12 - 25 at%. The thickness of the TiN film was 0.3 - 0.4 micrometers after treatment of the 5 micrometers Ti coating and about 900 angstroms for the 0.3 micrometers coating. Some characteristics of TiN films were examined and features of the nitriding process are discussed.

Citation Download Citation

Sergei Eskin "Laser formation of titanium nitride films as a result of Ti coating modification in a nitrogen atmosphere", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328619

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