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4 December 1998 Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating
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Abstract
Porous silicon (PS) is a promising but rather unstable photonic material. Plasma deposition of a protective amorphous hydrogenated carbon (a-C:H) coating was used to improve the stability of porous silicon's compositional and optical properties. a-C:H films, 0.2 - 0.5 micrometers thickness, were deposited on porous silicon at room temperature from a methane plasma generated in a five-electrode saddle-field glow-discharge chamber. Plasma-deposited films exhibited good adhesion, nano-scale smoothness, and excellent mechanical integrity. Photoluminescence, UV/VIS reflectance, SEM, and FTIR adsorption spectra of a-C:H/PS structures were measured. The a-C:H films were over 80% transparent in the 0.5 - 5 micrometers range and enhanced the stability of the luminescence of the light-emitting PS.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander Dorofeev, Franco Gaspari, Dammika Manage, Emmanuel Sagnes, Tome Kosteski, and Stefan Zukotynski "Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328604
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