Ultraviolet photorefraction in alpha-LiIO3

Romano A. Rupp; Jingjun Xu; H. Kabelka; Franco Laeri; U. Vietze

doi:10.1117/12.328708

4 December 1998 Ultraviolet photorefraction in α-LiIO₃

Romano A. Rupp, Jingjun Xu, H. Kabelka, Franco Laeri, U. Vietze

Proceedings Volume 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications; (1998) https://doi.org/10.1117/12.328708
Event: 1998 International Conference on Applications of Photonic Technology, 1998, Ottawa, Canada

Abstract

Experimental results on ultraviolet photorefraction in nominally pure and iron doped (alpha) -LiIO₃ crystals are presented. At room temperature two time constants and a characteristic minimum are observed in holographic erasure experiments. With decreasing temperature the maximum diffraction efficiency rises by two orders of magnitude. These features of the erasure kinetics and temperature dependence are explained by a theoretical model taking into account only electronic photoconductivity and ionic conductivity.

Citation Download Citation

Romano A. Rupp, Jingjun Xu, H. Kabelka, Franco Laeri, and U. Vietze "Ultraviolet photorefraction in α-LiIO₃", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328708

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