Paper
18 August 1998 Design and fabrication of 128x128 diffractive microlens arrays on Si substrates
Yi Li, Xinjian Yi, Jianhua Hao
Author Affiliations +
Proceedings Volume 3505, Imaging System Technology for Remote Sensing; (1998) https://doi.org/10.1117/12.317816
Event: Asia-Pacific Symposium on Remote Sensing of the Atmosphere, Environment, and Space, 1998, Beijing, China
Abstract
128 by 128 diffractive microlens arrays have been designed by considering the independent optical and processing parameters for 3-5 micrometers wavelength with a microlens size of 100 micrometers . The lens F number and array pitch are 1.5 and 100 micrometers , respectively. The diffractive microlens arrays have been fabricated on the surface of Si substrates by successive photolithography and Ar+ ion-beam-etching technique. The practical and fabrication method are discussed. The optical characteristics and measurements of the diffractive microlens arrays are presented.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Li, Xinjian Yi, and Jianhua Hao "Design and fabrication of 128x128 diffractive microlens arrays on Si substrates", Proc. SPIE 3505, Imaging System Technology for Remote Sensing, (18 August 1998); https://doi.org/10.1117/12.317816
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KEYWORDS
Microlens array

Silicon

Microlens

Sensors

Etching

Fabrication

Infrared radiation

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