Optical properties of micromachined polysilicon reflective surfaces with etching holes

Jun Zou; Colin Byrne; Chang Liu; David J. Brady

doi:10.1117/12.324315

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31 August 1998 Optical properties of micromachined polysilicon reflective surfaces with etching holes

Jun Zou, Colin Byrne, Chang Liu, David J. Brady

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Proceedings Volume 3511, Micromachining and Microfabrication Process Technology IV; (1998) https://doi.org/10.1117/12.324315
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

MUMPS (Multi-User MEMS Process) is receiving increasingly wide use in micro optics. We have investigated the optical properties of the polysilicon reflective surface in a typical MUMPS chip within the visible light spectrum. The effect of etching holes on the reflected laser beam is studied. The reflectivity and diffraction patterns at five different wavelengths have been measured. The optical properties of the polysilicon reflective surface are greatly affected by the surface roughness, the etching holes, as well as the material. The etching holes contribute to diffraction and reduction of reflectivity. This study provides a basis for optimal design of micromachined free-space optical systems.

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Jun Zou, Colin Byrne, Chang Liu, and David J. Brady "Optical properties of micromachined polysilicon reflective surfaces with etching holes", Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); https://doi.org/10.1117/12.324315

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