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31 August 1998 Photographic method for the fabrication of surface-relief diffractive optical elements
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Proceedings Volume 3511, Micromachining and Microfabrication Process Technology IV; (1998) https://doi.org/10.1117/12.324326
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
A photographic method using silver halide emulsions as photoresist medium has been used for the fabrication of relief blazed diffractive elements. The fabrication method comprises the design of half tone masks in the computer and the recording of a reduced image of the mask on the emulsion. After development a thin film of aluminum is laid over the emulsion to obtain a high reflective zone plate.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Enrique Navarrete-Garcia and Sergio Calixto-Carrera "Photographic method for the fabrication of surface-relief diffractive optical elements", Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); https://doi.org/10.1117/12.324326
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