Mathematical model for optimization of laser photoablated microstructures

Raja Nassar; Ashok Krishnan

doi:10.1117/12.324055

1 September 1998 Mathematical model for optimization of laser photoablated microstructures

Raja Nassar, Ashok Krishnan

Proceedings Volume 3512, Materials and Device Characterization in Micromachining; (1998) https://doi.org/10.1117/12.324055
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

Pulsed laser photoablation of polymers is a rapid prototyping technique that has applications for the manufacturing of high aspect ratio microparts. To enhance the manufacturing capability of the process, it is necessary to develop mathematical models to predict the scanning pattern of the pulsed laser on the material surface in order to etch a microstructure with a pre-specified geometry. In this study, we consider a model that predicts the number of pulses at each pixel of the surface to be scanned in order to produce a microstructure of a given geometry. In predicting the number of pulses at a pixel, the model takes into account the etch depth per pulse, the laser intensity distribution, and the geometry of the microstructure.

Citation Download Citation

Raja Nassar and Ashok Krishnan "Mathematical model for optimization of laser photoablated microstructures", Proc. SPIE 3512, Materials and Device Characterization in Micromachining, (1 September 1998); https://doi.org/10.1117/12.324055

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