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8 September 1998 Micromachined scanning Fabry-Perot interferometer
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Proceedings Volume 3514, Micromachined Devices and Components IV; (1998)
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
In this talk, a micromachined scanning Fabry-Perot interferometer (FPI) employing electrostatic actuators and tuned to the visible spectrum is described. Previous authors have demonstrated micromachined Fabry-Perot devices. The FPI described here offers a simpler process flow and a broader tuning range. The FPI is constructed by separately fabricating a MEMS actuator and semi-transparent optical mirrors. These are then assembled to complete the device. The completed device consists of two plane parallel mirrors separated by a small gap (< 1 micrometers ). The gap is formed by a sacrificial layer which is etched away to free the gold beams. Devices have been fabricated using single layer aluminum mirrors. Modeling results of devices incorporating dielectric multi-layer stacks will be discussed. Present devices are suitable for scanning the entire visible region of the spectrum 450 - 750 nm. Actuating voltages of approximately 60 V are required. Devices fabricated with aluminum mirrors have resolving powers of up to 50. Proposed applications include in situ measurements of plasma composition, colorimetric, and chemical analysis.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul M. Zavracky, K. L. Denis, H. K. Xie, Thomas E. Wester, and Paul L. Kelley "Micromachined scanning Fabry-Perot interferometer", Proc. SPIE 3514, Micromachined Devices and Components IV, (8 September 1998);

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