Ion-Etching As A Means Of Blazing And Optimizing Holographic Diffraction Gratings

J. M. Lerner; J. Flamand; A. Thevenon

doi:10.1117/12.933952

7 July 1983 Ion-Etching As A Means Of Blazing And Optimizing Holographic Diffraction Gratings

J. M. Lerner, J. Flamand, A. Thevenon

Proceedings Volume 0353, Industrial and Commercial Applications of Holography; (1983) https://doi.org/10.1117/12.933952
Event: 26th Annual Technical Symposium, 1982, San Diego, United States

Abstract

Holographic diffraction gratings, when used in a spectroscopic application, produce excellent image quality and stray-light rejection, but sometimes lack optimum efficiency. Ionetching through a sinusoidal photoresist groove into a glass substrate can produce triangular profiles comparable with the groove shape produced by classical diamond burnishing. This can be accomplished in both plano, spherical and aspheric substrates to produce gratings comparable in efficiency to classically ruled gratings.

Citation Download Citation

J. M. Lerner, J. Flamand, and A. Thevenon "Ion-Etching As A Means Of Blazing And Optimizing Holographic Diffraction Gratings", Proc. SPIE 0353, Industrial and Commercial Applications of Holography, (7 July 1983); https://doi.org/10.1117/12.933952

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