Accuracy differences among photomask metrology tools and why they matter

James E. Potzick

doi:10.1117/12.332842

18 December 1998 Accuracy differences among photomask metrology tools and why they matter

James E. Potzick

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332842
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, footprint, etc. But how do their potential accuracies differ, and is this important? In this context the effects of tool resolution, the meaning of measurement accuracy and traceability, the role of standards, and how these fit into the measurement model and affect manufacturing profitability are discussed. These considerations can help in choosing the right tool for the measurement task at hand and in evaluating the measurement results.

Citation Download Citation

James E. Potzick "Accuracy differences among photomask metrology tools and why they matter", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332842

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