Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor; Richard D. Eandi

doi:10.1117/12.332869

18 December 1998 Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor, Richard D. Eandi

Author Affiliations +

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332869
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Zygo Advanced Imaging Group's TINT Virtual Stepper Defect Analysis System's ability to predict CD printability of various known features on photomasks is tested. These features are analyzed with the TINT Virtual Stepper (VSS) software using known stepper parameters, and subsequently printed using a stepper with the same parameters. CD measurements, SEM imaging, and CD SEM analysis of the feature sites are compared to determine the ability of the TINT Virtual Stepper to accurately simulate feature CD printability.

Citation Download Citation

Darren Taylor and Richard D. Eandi "Advanced mask printability analysis using TINT Virtual Stepper System", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332869

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE