New approach to optical proximity correction

Anja Rosenbusch; Andrew C. Hourd; Casper A. H. Juffermans; Hartmut Kirsch; Frederic P. Lalanne; Wilhelm Maurer; Carmelo Romeo; Kurt G. Ronse; Patrick Schiavone; Michal Simecek; Olivier Toublan; John G. Watson; Wolfram Ziegler; Rainer Zimmermann

doi:10.1117/12.332856

18 December 1998 New approach to optical proximity correction

Anja Rosenbusch, Andrew C. Hourd, Casper A. H. Juffermans, Hartmut Kirsch, Frederic P. Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt G. Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, John G. Watson, Wolfram Ziegler, Rainer Zimmermann

Author Affiliations +

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332856
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

A hierarchical rule based optical proximity effect correction approach is presented. The approach has been driven by maskmaking and production requirements to make OPC a practical problem solution. The model based rule generation is presented, as well as benchmark tests on different state-of- the-art test chips.

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Anja Rosenbusch, Andrew C. Hourd, Casper A. H. Juffermans, Hartmut Kirsch, Frederic P. Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt G. Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, John G. Watson, Wolfram Ziegler, and Rainer Zimmermann "New approach to optical proximity correction", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332856

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