Paper
18 December 1998 Stage Cartesian self-calibration: a second method
Michael T. Takac, John M. Whittey
Author Affiliations +
Abstract
A physical two-dimensional Cartesian reference has been demonstrated using group theory principles pioneered by Michael Raugh. The first stage Cartesian self-calibration introduction to the microlithographic industry was developed by Stanford University, Hewlett Packard, and IBM San Jose using Leica's LMS-2000 and LMS-2020 platforms. Recently Leica developed a different method based on a similar theory to achieve a Cartesian calibration for their LMS-IPRO x-y metrology system. A review of these methods and a comparison of the results obtained between the methods are presented.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Takac and John M. Whittey "Stage Cartesian self-calibration: a second method", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332853
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Calibration

Metrology

Photomasks

Lithography

Inspection

Interferometers

Manufacturing

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