The AIMS tool: its potentials, applications, and issues

Syed A. Rizvi; Nathan A. Diachun

doi:10.1117/12.332851

18 December 1998 The AIMS tool: its potentials, applications, and issues

Syed A. Rizvi, Nathan A. Diachun

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332851
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

The AIMS Tool, manufactured by the Zeiss of Jena, Germany, is a unique combination of sophisticated optics and ingenious software designed to simulate the image of mask pattern as it would be created by a stepper on its wafer plane. This paper reviews some of the machine' capabilities and potentials, and shows its role in complementing the state of the art metrology tools. Most importantly, the paper explores ways of enhancing the productivity and utilization of the tool by strong participation of the newly formed AIMS Tool User's Group.

Citation Download Citation

Syed A. Rizvi and Nathan A. Diachun "The AIMS tool: its potentials, applications, and issues", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332851

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