Laser ablation of PMMA doped with benzyl

Jun Wang; Hiroyuki Niino; Akira Yabe

doi:10.1117/12.317934

15 August 1998 Laser ablation of PMMA doped with benzyl

Jun Wang, Hiroyuki Niino, Akira Yabe

Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317934
Event: Photonics China '98, 1998, Beijing, China

Abstract

KrF-laser ablation of poly(methylmethacrylate) (PMMA) doped with benzil was studied from the viewpoint of nonlinear absorption of the PMMA film during the laser irradiation. After measuring the relationship between the transmission and incident laser intensity, we developed a novel method to obtain absorption coefficient depending on laser intensity. Using the nonlinear absorption coefficient of PMMA doped with benzil, we succeeded in fitting the relationship of etch depth and laser intensity. The dependence of concentration of benzil in PMMA film and the difference between benzil and pyrene were also discussed.

Citation Download Citation

Jun Wang, Hiroyuki Niino, and Akira Yabe "Laser ablation of PMMA doped with benzyl", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317934

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