Laser-induced removal of organic contaminants from metal substrates

Wen Dong Song; Yongfeng Lu; Q. Chen; Tohsiew Low

doi:10.1117/12.317959

15 August 1998 Laser-induced removal of organic contaminants from metal substrates

Wen Dong Song, Yongfeng Lu, Q. Chen, Tohsiew Low

Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317959
Event: Photonics China '98, 1998, Beijing, China

Abstract

Laser-induced removal of organic contaminants, such as grease and wax, on Cr substrate surfaces was studied. The laser cleaning efficiency was analyzed by an optical microscope and an Auger Electron Spectroscopy (AES). It was found that the contaminants in the irradiated area can be effectively removed by pulsed laser irradiation and cleaning efficiency can be reached to 80% above under a certain cleaning condition without damage. The damage threshold of Cr substrates was obtained by numerical simulation, which is in good consistency with the experimental threshold.

Citation Download Citation

Wen Dong Song, Yongfeng Lu, Q. Chen, and Tohsiew Low "Laser-induced removal of organic contaminants from metal substrates", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317959

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