Translator Disclaimer
Paper
12 August 1998 Novel method for fabricating waveguide grating by phase mask technique
Author Affiliations +
Abstract
We report the fabrication of waveguides gratings coupler in photoresist by using a volume holographic gratings and that of the holographic gratings by Red Sensitive Photopolymer at 632.8 nm. The holographic gratings can produce diffracted light of 0 and -1 orders with equal intensity. The two diffracted light beams yield the interference fringe of period in near field, which is as laser sources to expose the photoresist on waveguide.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shaojie Ma, Yan Li, Mai Xu, Yushan Yi, and Jiuling Lin "Novel method for fabricating waveguide grating by phase mask technique", Proc. SPIE 3551, Integrated Optoelectronics II, (12 August 1998); https://doi.org/10.1117/12.317967
PROCEEDINGS
3 PAGES


SHARE
Advertisement
Advertisement
Back to Top