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6 August 1998 Bandpass filter by a stretch and double-exposure technique
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Abstract
We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask. We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings. Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length. We theoretically analyzed the grating structure and its reflection spectrum. The filter’s characteristics can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kaiming Zhou, Guiren An, Huang Ge, Wei Wang, Lin Zhang, and Ian Bennion "Bandpass filter by a stretch and double-exposure technique", Proc. SPIE 3552, Fiber Optic Components and Optical Communication II, (6 August 1998); https://doi.org/10.1117/12.318054
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