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5 August 1998 Influence of deposition parameters on adhesion of diamondlike carbon film prepared by pulse-arc plasma deposition
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Abstract
Diamond-like carbon films are prepared on silicon by pulse- arc plasma deposition. By means of orthogonal test method and scratch test technique, the relationships between adhesion of the deposited films and deposition parameters have been systematically analyzed. The results show that the substrate temperature, the voltage U across the interelectrode and the frequency of pulse greatly effect adhesion of the deposited films. The adhesion is strengthened with increasing substrate temperature and decreasing voltage across the interelectrode. A threshold frequency exists in dependence of adhesion of the deposited films on the frequency. The scratch test also indicates that intensive internal stress plays an important role in the adhesion of diamond-like carbon film.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhinong Yu and Yixing Yan "Influence of deposition parameters on adhesion of diamondlike carbon film prepared by pulse-arc plasma deposition", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); https://doi.org/10.1117/12.318281
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