Interference measurements for roughness of silicon mirror with Twyman interferometer

Yaoning Zhang; Xiaoli Zhang; ZuHai Cheng

doi:10.1117/12.318376

10 August 1998 Interference measurements for roughness of silicon mirror with Twyman interferometer

Yaoning Zhang, Xiaoli Zhang, ZuHai Cheng

Proceedings Volume 3558, Automated Optical Inspection for Industry: Theory, Technology, and Applications II; (1998) https://doi.org/10.1117/12.318376
Event: Photonics China '98, 1998, Beijing, China

Abstract

Supposed the random distribution of height deviation can be represented as Gaussian distribution, the relationship between intensity contrast C of interference fringes, determined at Twyman Interferometer, and the roughness (sigma) of mirror's surface is deduced. Roughness measurements of four silicon mirrors have performed with Twyman Interferometer. The result of measurements is agree with the data, measured by 6JA profiler in tendency. This method is a full-field, noncontacting interference measurement so that it can be developed as an inspection on line. Then, the surface profile analysis can also be performed from interference fringes. Therefore this method provide a controlling way in polish process.

Citation Download Citation

Yaoning Zhang, Xiaoli Zhang, and ZuHai Cheng "Interference measurements for roughness of silicon mirror with Twyman interferometer", Proc. SPIE 3558, Automated Optical Inspection for Industry: Theory, Technology, and Applications II, (10 August 1998); https://doi.org/10.1117/12.318376

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