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10 August 1998 Interference measurements for roughness of silicon mirror with Twyman interferometer
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Abstract
Supposed the random distribution of height deviation can be represented as Gaussian distribution, the relationship between intensity contrast C of interference fringes, determined at Twyman Interferometer, and the roughness (sigma) of mirror's surface is deduced. Roughness measurements of four silicon mirrors have performed with Twyman Interferometer. The result of measurements is agree with the data, measured by 6JA profiler in tendency. This method is a full-field, noncontacting interference measurement so that it can be developed as an inspection on line. Then, the surface profile analysis can also be performed from interference fringes. Therefore this method provide a controlling way in polish process.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yaoning Zhang, Xiaoli Zhang, and ZuHai Cheng "Interference measurements for roughness of silicon mirror with Twyman interferometer", Proc. SPIE 3558, Automated Optical Inspection for Industry: Theory, Technology, and Applications II, (10 August 1998); https://doi.org/10.1117/12.318376
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