Paper
19 August 1998 High-optical-quality LiNbO3 thin films obtained by pulsed laser deposition
D. Ghica, Mariuca Gartner, F. Ciobanu, V. Nelea, C. Martin, Ion N. Mihailescu
Author Affiliations +
Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.320993
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary
Abstract
We report the successful growth of high optical quality LiNbO3 thin films (high birefringence and good transparency over the entire visible spectral range) by pulse laser deposition (PLD) on Si substrates. PLD of a LiNbO3 single-crystal target was carried out using a KrF* excimer laser ((lambda) equals 248 nm, E equals 80 mJ, (tau) equals 20 ns, v equals 2 Hz). The thin films have been deposited in oxygen and, for some of them, a thermal treatment has been applied in an oxygen atmosphere. The thin films have been characterized by grazing incidence X-ray diffraction, spectroscopic ellipsometry and Fourier transform infrared spectroscopy.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Ghica, Mariuca Gartner, F. Ciobanu, V. Nelea, C. Martin, and Ion N. Mihailescu "High-optical-quality LiNbO3 thin films obtained by pulsed laser deposition", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); https://doi.org/10.1117/12.320993
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Cited by 2 scholarly publications.
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KEYWORDS
Thin films

Oxygen

Pulsed laser deposition

FT-IR spectroscopy

Refractive index

Silicon

Transparency

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