Optical constants of thin CVD-Tungsten oxide films

Anna M. Szekeres; D. S. Gogova

doi:10.1117/12.321009

19 August 1998 Optical constants of thin CVD-Tungsten oxide films

Anna M. Szekeres, D. S. Gogova

Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.321009
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary

Abstract

CVD-tungsten oxides were obtained at 300 degree(s)C on glass substrates by pyrolitical decomposition of W(CO)₆ vapor in argon/oxygen stream at atmospheric pressure. The thin films were examined by spectroscopic ellipsometry in the wavelength range of 0.3 - 0.8 micrometers . It was found that as- deposited oxides are rather porous and predominantly amorphous but crystalline phase is also present. During the annealing at 450 and 500 degree(s)C the oxide becomes fully crystallized and yet it preserves its porosity. The high level of porosity is reflected in the low values of the refractive indices (1.9 - 1.5) and the optical band gap energies (3.04 - 3.11 eV).

Citation Download Citation

Anna M. Szekeres and D. S. Gogova "Optical constants of thin CVD-Tungsten oxide films", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); https://doi.org/10.1117/12.321009

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