Relaation of photodarkening in SiO-As2S3 composite layers

Ivan Z. Indutnyi; Peter E. Shepeliavii

doi:10.1117/12.320954

19 August 1998 Relaation of photodarkening in SiO-As₂S₃ composite layers

Ivan Z. Indutnyi, Peter E. Shepeliavii

Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.320954
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary

Abstract

Investigated in this work is the reversible photostimulated red absorption edge shift (photodarkening), (Delta) E_g, of As₂S₃ nanoparticles embedded into the SiO matrix. As compared to continuous films, the remarkable (Delta) E_g increase (up to 4 times) with decreasing of As₂S₃ particle sizes was revealed. The exponential dependence of (Delta) E_g on storing time at different temperatures has been obtained. An activation energy of the transition of As₂S₃ nanoparticles structure from metastable, photoexposed state to ground, annealed state is equal 0.78 +/- 0.06 eV. The effects are related to a space confinement of the photoexcited carrier diffusion length and influence of particle sizes on the intermediate-range order scale structure relaxation in the As₂S₃ nanoparticles.

Citation Download Citation

Ivan Z. Indutnyi and Peter E. Shepeliavii "Relaation of photodarkening in SiO-As₂S₃ composite layers", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); https://doi.org/10.1117/12.320954

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