ArF radiation resistance of optical coatings on CaF2 in relation to the surface finish of the substrate

Roland Thielsch; Joerg Heber; Angela Duparre; Norbert Kaiser; Klaus R. Mann; Eric Eva

doi:10.1117/12.344385

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7 April 1999 ArF radiation resistance of optical coatings on CaF₂ in relation to the surface finish of the substrate

Roland Thielsch, Joerg Heber, Angela Duparre, Norbert Kaiser, Klaus R. Mann, Eric Eva

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Proceedings Volume 3578, Laser-Induced Damage in Optical Materials: 1998; (1999) https://doi.org/10.1117/12.344385
Event: Laser-Induced Damage in Optical Materials: 1998, 1998, Boulder, CO, United States

Abstract

CaF₂ has received increasing attention as a promising substrate for coatings in the VUV range. Optimization of the optical properties of these optical components requires the study of basic characteristics of the coated and uncoated CaF₂ substrates such as surface roughness, optical performance, absorption and scatter losses, and laser induced damage threshold. The investigations have revealed the influence of different substrate polishing grades on the quality of AR-193nm -and HR-193nm/0 degrees coated samples. LIDT values at the ArF-excimer laser wavelength were measured as high as 5.6 J/cm² and 4.6 J/cm² for the best AR- and HR-coated samples, respectively.

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Roland Thielsch, Joerg Heber, Angela Duparre, Norbert Kaiser, Klaus R. Mann, and Eric Eva "ArF radiation resistance of optical coatings on CaF₂ in relation to the surface finish of the substrate", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344385

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