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7 April 1999 DUV laser light sources (Abstract Only)
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Abstract
High power laser sources of deep UV radiation play an important role in numerous applications such as microlithography, micromachining and material modification. Usefulness of deep UV lasers for each specific application arises from their unique characteristics, most importantly wavelength, temporal and spatial coherence and intensity distribution of the beam. Recent progress in the areas of DUV optical materials, laser resonators and electronics made possible dramatic improvements in power levels, brightness and intensity uniformity at these extremely short wavelengths, combined with long term stability and reliability. We report on recent advances in development of high power excimer lasers at the wavelengths of 248 nm, 1 93 nm and 1 57 nm for applications requiring high spectral brightness, such as microlithography, and high spatial and temporal coherence, such as writing of fiber Bragg gratings. We also present new data on high power all-solid-state laser sources of 266 nm, 213 nm and tunable UV radiation which are becoming a real alternative to excimer lasers in some DUV applications. We discuss impact of the long-term degradation of optical elements on the performance, reliability and running costs of recently developed DUV lasers
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergei V. Govorkov and Robert Willard "DUV laser light sources (Abstract Only)", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344437
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