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7 April 1999 Dependence of compaction in fused silica on laser pulsewidth at 248 nm (Abstract Only)
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Designers of DUV lithographic lenses are faced with serious materials problems relating to compaction and color-center formation in fused silica, especially at 193 nm. However, these problems, while less sever, are not negligible at 248 nm. Compaction appears to be the more serious, since it degrades imaging performance and effectively sets the lifetime limit for the lens. Previous damage studies have clearly shown that fused silica compacts as a function of the parameter grouping (NI2/(tau) ), where (tau) is the pulsewidth. This fact has strongly influenced the design of the excimer laser light source by stressing repetition rate over pulse energy as a way of achieving high average power, and by driving the optical pulsewidth to be as long as possible. These studies, however, have emphasized the dependence of damage rates on the energy density I(mJ/cm2), whereas the optical pulsewidth (tau) has been given only cursory attention and has not been well controlled during the damage experiments. In this paper we report the results of an experiment to more clearly establish the functional dependency of compaction on laser pulsewidth.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard L. Sandstrom, Richard G. Morton, and Thomas P. Duffey "Dependence of compaction in fused silica on laser pulsewidth at 248 nm (Abstract Only)", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999);


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