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21 April 1999 Improved all-silica fibers for deep-UV applications
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Proceedings Volume 3596, Specialty Fiber Optics for Medical Applications; (1999) https://doi.org/10.1117/12.346719
Event: BiOS '99 International Biomedical Optics Symposium, 1999, San Jose, CA, United States
Abstract
Deep UV application of optical fibers has been restricted due to the strong photodegradation in silica fibers transmitting deep UV light. We have developed an improved all silica preform for the production of multimode fibers with drastically improved resistance to UV-light. Two key experiments have been performed in order to characterize the solarization behavior of such fibers: (1) ArF-excimer laser and deuterium lamp photodegradation spectroscopy enables the in situ observation of defect center creation. (2) Long time photodegradation excimer laser experiments (ArF and KrF) are a good tool to predict the fiber's lifetime for applications with such lasers. Compared to standard high OH all silica fibers the optimized fibers show an exceptionally low creation of E'-centers (215 nm). Hydrogen doping of such fibers further increases the UV-resistance: Even after prolonged excimer laser irradiation (ArF: 20 X 106 pulses, 5 mJ/cm2, 400 Hz; KrF: 20 X 106 pulses, 50 mJ/cm2, 500 Hz) these fibers maintained their very high initial transmission, neither E'-center nor NBOH-center (265 nm) absorption could be observed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Vydra and Gerhard F. Schoetz "Improved all-silica fibers for deep-UV applications", Proc. SPIE 3596, Specialty Fiber Optics for Medical Applications, (21 April 1999); https://doi.org/10.1117/12.346719
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