Paper
26 March 1999 Transparent conductive sol-gel thin films for photonic applications
Terho K. Kololuoma, Juha T. Rantala, Jouko Vaehaekangas, Risto S. Laitinen
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Abstract
Antimony doped tin dioxide (SnO2:Sb) thin films are fabricated by a new simplified sol-gel process. Films are prepared from an alcoholic solution of SnCl4(DOT)4H2O doped with SbCl3. Films are deposited by the spin coating process on sodalime glass, borosilicate glass, silicon wafers and ceramic alumina substrates. The chemical reactions during the heat treatment are monitored by DSC and TG. The chemical composition of the coatings are determined by scanning electron microscopy (SEM). Sheet resistance, Rs, is measured using a linear four-probe technique. Optical properties of the films are also determined. The resistivity of the thin films are presented as a function of the antimony doping level. The smallest sheet resistance of 200 (Omega) /$DAL is found for a 250 nm thick coating on a borosilicate substrate. It is observed that the sheet resistance does not decrease linearly with increasing film thickness. Fabrication possibilities of these materials for the integrated optics based sensors including patterning methods are discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Terho K. Kololuoma, Juha T. Rantala, Jouko Vaehaekangas, and Risto S. Laitinen "Transparent conductive sol-gel thin films for photonic applications", Proc. SPIE 3620, Integrated Optics Devices III, (26 March 1999); https://doi.org/10.1117/12.343723
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Cited by 2 scholarly publications and 1 patent.
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KEYWORDS
Tin

Antimony

Coating

Scanning electron microscopy

Doping

Thin films

Optical lithography

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