Paper
6 August 1999 Reactor and process modeling in optoelectronic device fabrication
Meyya Meyyappan, Deepak Bose
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Meyya Meyyappan and Deepak Bose "Reactor and process modeling in optoelectronic device fabrication", Proc. SPIE 3625, Physics and Simulation of Optoelectronic Devices VII, (6 August 1999); https://doi.org/10.1117/12.356905
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KEYWORDS
Plasma

Semiconducting wafers

Instrument modeling

Process modeling

Chemical vapor deposition

Optoelectronic devices

Chlorine

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