Analysis of adhesion behavior of microresist pattern by direct collapse method with atomic force microscope tip

Akira Kawai

doi:10.1117/12.350844

14 June 1999 Analysis of adhesion behavior of microresist pattern by direct collapse method with atomic force microscope tip

Akira Kawai

Author Affiliations +

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350844
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

By applying load directly with a micro cantilever tip, a resist micro pattern can be collapsed easily. The load when pattern collapse occurred decreases with increasing line width of resist pattern. Micro resist pattern adhering on a substrate is analyzed directly and quantitatively by using atomic force microscopy (AFM) tip. The collapse properties of KrF resist line patterns ranging from 170 to 730 nm in width were investigated for line width dependency. The load for pattern collapse decreases as narrowing of pattern width, however, it decreases considerably when the line width is approximately 400nm. BY combining with analysis of internal stress distribution by finite element method, line width dependency of resist pattern destruction can be clarified. The i-line resist patterns of 610nm dot shape were investigated for the environmental dependency of pattern collapse. In deionized (DI)-water, the load for pattern collapse is approximately one-thirtieth as large as that in dry air. The balance model among surface energy can be adopted for analyzing intrusion phenomenon of DI-water into resist/substrate interface. It can be explained quantitatively that the intrusion of DI-water acts to weaken the adhesion strength of resist micro pattern to the substrate. The validity and reliability of this technique are discussed.

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Akira Kawai "Analysis of adhesion behavior of microresist pattern by direct collapse method with atomic force microscope tip", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350844

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