Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years

Syed A. Rizvi; A. Meyyappan

doi:10.1117/12.350861

14 June 1999 Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years

Syed A. Rizvi, A. Meyyappan

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350861
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Mask making in the coming years will face major challenges. Feature measurements in the mask will no longer be restricted to 2D but will require information on the third dimension as well. High precision AFMs will be needed not only for measuring feature dimensions but also as a diagnostic tool for the fabrication of high quality masks.

Citation Download Citation

Syed A. Rizvi and A. Meyyappan "Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350861

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