CD error sensitivity to "sub-killer" defects at k1 near 0.4

J. Fung Chen; Nathan A. Diachun; Kent H. Nakagawa; Robert John Socha; Mircea V. Dusa; Thomas L. Laidig; Kurt E. Wampler; Roger F. Caldwell; Douglas J. Van Den Broeke

doi:10.1117/12.350858

14 June 1999 CD error sensitivity to "sub-killer" defects at k1 near 0.4

J. Fung Chen, Nathan A. Diachun, Kent H. Nakagawa, Robert John Socha, Mircea V. Dusa, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell, Douglas J. Van Den Broeke

Author Affiliations +

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350858
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Recent observations indicate that CD control for the 0.18 micrometers process generation using KrF exposure could be sensitive to borderline detectable defect sizes on a 4X reticle. It is of interest to determine if these 'sub- killer' defect sizes can become process window limiting. It is also important to determine if CD error is sensitive to the interaction between defects and scattering bar OPC features. The experiment was based on a typical 0.18 micrometers process using the Defect Sensitivity Monitor reticle - designed by MicroUnity and manufactured by Photronics. Only isolated features were investigated in this work. Greater than 10 percent printed CD error was found for defects occurring on the main feature such as a 200 nm bump or a 250 nm divot on a 4X reticle. Greater than 6 percent of the exposure latitude can be lost due to +/- 50 nm mask feature width deviations. A 200 nm-chrome spot 4X-reticle defect located between a main feature and an SB can cause more than a 10 percent printed CD error. Defects occurring on scattering bars such as bump a d break types have less influence on the printed CD. The CD error is negligible for +/- 100 nm SB width variation on a 4X reticle.

Citation Download Citation

J. Fung Chen, Nathan A. Diachun, Kent H. Nakagawa, Robert John Socha, Mircea V. Dusa, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell, and Douglas J. Van Den Broeke "CD error sensitivity to "sub-killer" defects at k1 near 0.4", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350858

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available