Paper
14 June 1999 Interferometrical profilometry at surfaces with varying materials
Holger Jennewein, Harald Gottschling, Thomas Ganz, Theo T. Tschudi
Author Affiliations +
Abstract
One problem interferometric profilers have in common, is that the phase change of the light which is reflected at the probe, depends on the complex refractive index of the probe's material and influences the profilers results. This article describes the principle of an optical profilometer which is a combination between an interferometric profiler and a micro-ellipsometer. This combination allows us to determine the geometrical height of a surface profile, with an accuracy of a few nanometers, even when the material of the probe varies laterally. The interferometric profiler uses an acousto-optical deflector in such a way, that it produces two first orders of diffraction, beside the zero order. Due to the principle of the acousto-optical deflector, these two first orders wave slightly different frequencies. This makes it possible to apply the principle of heterodyne detection to measure the difference in phase of these two beams. From this, the phase profile of the scanned surface can be calculated. With the help of the micro-ellipsometer the material dependency the phase of the reflected light can be determined with a high lateral resolution. Therefore the probe beam is focused on the probe with a microscope objective to reach a lateral resolution which is the same as that for the profilometer. Due to the principle of this micro-ellipsometer the probe is analyzed for several angles of incidence simultaneously. With the data of the micro-ellipsometer it is possible to compensate the errors of the profiler's data caused by varying materials.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Holger Jennewein, Harald Gottschling, Thomas Ganz, and Theo T. Tschudi "Interferometrical profilometry at surfaces with varying materials", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350789
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Interferometry

Refractive index

Phase measurement

Laser beam diagnostics

Objectives

Microscopes

Diffraction

Back to Top