Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks

Thomas Struck; Klaus-Dieter Roeth

doi:10.1117/12.350795

14 June 1999 Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks

Thomas Struck, Klaus-Dieter Roeth

Author Affiliations +

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350795
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

One condition for efficient work with more than one metrology system, in one or several facilities, is the matching of the pattern placement metrology tools. The Siemens mask house uses tow pattern placement metrology systems, an LMS 2000 and an LMS IPRO system. Both system are correlated to the PTB standard and match in between. The different measurement performance of the two systems leads to different applications of their use. Both metrology system have ben matched with external facilities. Data will be presented on metrology correlation with Siemens' two 'second source' sites.

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Thomas Struck and Klaus-Dieter Roeth "Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350795

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