New optimization concepts for photolithography production processes

Dumitru Gh. Ulieru

doi:10.1117/12.350878

14 June 1999 New optimization concepts for photolithography production processes

Dumitru Gh. Ulieru

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350878
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

This paper examines the theory, methodology and benefits of using CD distribution as a metric for determining the quality of a lithography process. A method is presented for predicting the CD limited yield of a photolithographic process using a combination of RoCD and either RoLith/2 and RoLith/3D. Several examples are used in order to show the major benefits of this method.

Citation Download Citation

Dumitru Gh. Ulieru "New optimization concepts for photolithography production processes", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350878

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