Production metrology and control of color filter array photolithography for CMOS imagers

Arnold W. Yanof; A. Daou; James P. Annand; M. Pantel; Cliff I. Drowley; John N. Helbert; Carlos L. Ygartua; Clive Hayzelden

doi:10.1117/12.350821

14 June 1999 Production metrology and control of color filter array photolithography for CMOS imagers

Arnold W. Yanof, A. Daou, James P. Annand, M. Pantel, Cliff I. Drowley, John N. Helbert, Carlos L. Ygartua, Clive Hayzelden

Author Affiliations +

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350821
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The color filter array (CFA) for an image-producing semiconductor device is composed of patterned red-, and green- and blue-colored photoresist structures. CFA photolithography is rather different from that of most semiconductor process levels.

Citation Download Citation

Arnold W. Yanof, A. Daou, James P. Annand, M. Pantel, Cliff I. Drowley, John N. Helbert, Carlos L. Ygartua, and Clive Hayzelden "Production metrology and control of color filter array photolithography for CMOS imagers", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350821

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available