Approaches to etch-resistant 193-nm photoresists: performance and prospects

Robert D. Allen; Juliann Opitz; Hiroshi Ito; Thomas I. Wallow; Daniel V. Casmier; Richard A. Di Pietro; Phillip J. Brock; Gregory Breyta; Ratnam Sooriyakumaran; Carl E. Larson; Donald C. Hofer; Pushkara Rao Varanasi; Ann Marie Mewherter; Saikumar Jayaraman; Richard Vicari; Larry F. Rhodes; Shenliang Sun

doi:10.1117/12.350262

11 June 1999 Approaches to etch-resistant 193-nm photoresists: performance and prospects

Robert D. Allen, Juliann Opitz, Hiroshi Ito, Thomas I. Wallow, Daniel V. Casmier, Richard A. Di Pietro, Phillip J. Brock, Gregory Breyta, Ratnam Sooriyakumaran, Carl E. Larson, Donald C. Hofer, Pushkara Rao Varanasi, Ann Marie Mewherter, Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, Shenliang Sun

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Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350262
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have investigated three substantially different routes to 193nm single layer resists. This paper will attempt to shed light on the strengths and weaknesses of each approach. Design principles, polymer synthesis and properties, and resist properties will be discussed for the three main branches of 193nm resists.

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Robert D. Allen, Juliann Opitz, Hiroshi Ito, Thomas I. Wallow, Daniel V. Casmier, Richard A. Di Pietro, Phillip J. Brock, Gregory Breyta, Ratnam Sooriyakumaran, Carl E. Larson, Donald C. Hofer, Pushkara Rao Varanasi, Ann Marie Mewherter, Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, and Shenliang Sun "Approaches to etch-resistant 193-nm photoresists: performance and prospects", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350262

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