Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains

Jin-Baek Kim; Jong Jin Park; Ji Hyun Jang; Jae-Young Kim

doi:10.1117/12.350247

11 June 1999 Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains

Jin-Baek Kim, Jong Jin Park, Ji Hyun Jang, Jae-Young Kim

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350247
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have examined a novel class of ketal based deep UV photoresist. 1,4-Dioxaspiro(4,4)nonane-2-methyl methacrylate was synthesized and polymerized. A ketal group of poly(1,4- dioxaspiro(4,4)nonane-2-methyl methacrylate) hydrolyzes under acid catalysis to give two alcohol functionalities and a cyclopentanone molecule. The ketal polymer is insoluble in an aqueous developer, while the hydrolyzed products are soluble.It was found the cyclopentanone product affects diffusion of acid in the resist. As a result, the generated cyclopentanone increases mobility of the acid significantly.

Citation Download Citation

Jin-Baek Kim, Jong Jin Park, Ji Hyun Jang, and Jae-Young Kim "Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350247

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