Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Jin-Baek Kim; Bum-Wook Lee; Jae-Sung Kang; Seong-Ju Kim; Joo Hyeon Park; Dong-Chul Seo; Ki-Ho Baik; Jae Chang Jung; Chi-Hyeong Roh

doi:10.1117/12.350194

11 June 1999 Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Jin-Baek Kim, Bum-Wook Lee, Jae-Sung Kang, Seong-Ju Kim, Joo Hyeon Park, Dong-Chul Seo, Ki-Ho Baik, Jae Chang Jung, Chi-Hyeong Roh

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350194
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In order to develop a new series of chemically amplified photoresists for 193-nm lithography, norbornene substituted with a steroid derivative was copolymerized with maleic anhydride by free radical polymerization. The resulting polymers have excellent transmittance at 193 nm and possess good thermal stability up to 260 degrees C. The resist formulated with the polymers showed better dry-etching resistance than the conventional poly(hydroxystyrene) resist for Cl₂/O₂ plasma. With the standard developer, the resists from 0.15-0.20 micrometers patterns at doses of 5-18 mJ/cm² using an ArF excimer laser stepper.

Citation Download Citation

Jin-Baek Kim, Bum-Wook Lee, Jae-Sung Kang, Seong-Ju Kim, Joo Hyeon Park, Dong-Chul Seo, Ki-Ho Baik, Jae Chang Jung, and Chi-Hyeong Roh "Chemically amplified resists based on the norbornene copolymers with steroid derivatives", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350194

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