Effect of developer temperature and normality on chemically amplified photoresist dissolution

Mark John Maslow; Chris A. Mack; Jeff D. Byers

doi:10.1117/12.350150

11 June 1999 Effect of developer temperature and normality on chemically amplified photoresist dissolution

Mark John Maslow, Chris A. Mack, Jeff D. Byers

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350150
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The effects of developer temperature and developer normality on the dissolution behavior of a 248nm chemically amplified resist are examined using development rate measurements. Using a RDA-790 development rate measurement tool employing a 470nm Blue LED measurement wavelength, dissolution rats as a function of dose and depth into the resist were measured. Each data set was analyzed and the performance of rate versus t-BOC concentration was fit to appropriate models. The variation of these results with developer temperature has led to further temperature-dependent characterization of the dissolution modeling parameters. The variation of dissolution rate with developer normality has led to an initial characterization of the normality-dependent dissolution modeling parameters. The maximum dissolution rate R_max is shown to exhibit two regions of Arrhenius behavior with a well defined activation energy for both. The dissolution selectivity parameter n proves to have a more complicated behavior.

Citation Download Citation

Mark John Maslow, Chris A. Mack, and Jeff D. Byers "Effect of developer temperature and normality on chemically amplified photoresist dissolution", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350150

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available