Novel 193-nm single-layer resist containing a multifunctional monomer

Geunsu Lee; Cha-Won Koh; Jae Chang Jung; Min-Ho Jung; Hyeong-Soo Kim; Ki-Ho Baik; Il-Hyun Choi

doi:10.1117/12.350206

Translator Disclaimer

11 June 1999 Novel 193-nm single-layer resist containing a multifunctional monomer

Geunsu Lee, Cha-Won Koh, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik, Il-Hyun Choi

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350206
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have newly developed a novel multi-functional monomer. Application of this monomer also allows us to introduce another unit to further improve its etch resistance. Furthermore, our novel resist containing this multi- functional monomer exhibits an excellent adhesion to Si substrate, an improved CD linearity, a high sensitivity, a good contrast, and a high synthetic yield. A 110nm L/S pattern was successfully at 1:2 pitch of a strong PSM was also successfully obtained by using a 2.38wt percent TMAH aqueous solution as a developer.

Citation Download Citation

Geunsu Lee, Cha-Won Koh, Jae Chang Jung, Min-Ho Jung, Hyeong-Soo Kim, Ki-Ho Baik, and Il-Hyun Choi "Novel 193-nm single-layer resist containing a multifunctional monomer", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350206

ACCESS THE FULL ARTICLE