Optical lithography simulation and photoresist optimization for photomask fabrication

Benjamen M. Rathsack; Cyrus Emil Tabery; Steven A. Scheer; Mike Pochkowski; Cecilia E. Philbin; Franklin D. Kalk; Clifford L. Henderson; Peter D. Buck; C. Grant Willson

doi:10.1117/12.350173

11 June 1999 Optical lithography simulation and photoresist optimization for photomask fabrication

Benjamen M. Rathsack, Cyrus Emil Tabery, Steven A. Scheer, Mike Pochkowski, Cecilia E. Philbin, Franklin D. Kalk, Clifford L. Henderson, Peter D. Buck, C. Grant Willson

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350173
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The demand for smaller and more uniform features on photomasks is rapidly increasing. The complexity of these patterns is also increasing with the need for optical proximity correction and phase shifting structures. These complex mask features demand unprecedented accuracy in pattern placement and dimensional control. We have conducted research designed to optimize the process for laser pattern generation by improving resolution and process latitude. Lithographic simulation was utilized for process optimization because of the very high cost of mask patterning and metrology experiments.

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Benjamen M. Rathsack, Cyrus Emil Tabery, Steven A. Scheer, Mike Pochkowski, Cecilia E. Philbin, Franklin D. Kalk, Clifford L. Henderson, Peter D. Buck, and C. Grant Willson "Optical lithography simulation and photoresist optimization for photomask fabrication", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350173

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