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11 June 1999 Process and performance optimization of bottom antireflective coatings: II
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The newly developed AZ BARLi II coating material is a photoresist solvent-based bottom antireflective coating (BARC) for i-line lithographic application. The coating material has good compatibility with common edge bead removal solvents such as ethyl lactate, PGME, or PGMEA mixed with ethyl lactate or PGME. To evaluate the BARC material, its chemical compatibility with common EBR solvents has been tested by several analytical techniques including liquid particle counts and surface defect studies. Both top and bottom EBR dispense processes have been investigated and optimized. Improvements on edge roughness, visual cleanliness, and the BARC coating buildup at the edge will be discussed in this paper.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuji Ding, John P. Sagan, Jianhui Shan, Eleazar Gonzalez, Sunit S. Dixit, Ying Liu, and Dinesh N. Khanna "Process and performance optimization of bottom antireflective coatings: II", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999);

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