Recent progress in 193-nm antireflective coatings

James D. Meador; Douglas J. Guerrero; Gu Xu; Xie Shao; Norman Dobson; James B. Claypool; Kelly A. Nowak

doi:10.1117/12.350269

11 June 1999 Recent progress in 193-nm antireflective coatings

James D. Meador, Douglas J. Guerrero, Gu Xu, Xie Shao, Norman Dobson, James B. Claypool, Kelly A. Nowak

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350269
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

This paper presents the chemistries and properties of organic, spin-on, bottom antireflective coatings (BARCs) that are designed for 193 nm lithography. All of the BARCs are thermosetting and use dye-attached/incorporated polymers. A first generation product, NEXT, will soon be commercialized. NEXT is built form i-line and deep-UV chemistries with the polymeric constituent being a substitute novolac. This product provide outstanding resolution of 0.16 micrometers L/S with several 193 nm photoresists. Second generation chemical platforms under study include acrylics, polyesters, and polyethers with the 193 nm absorbing chromophore being an aromatic function. The performance of selected BARCs from the four platforms is described, including: optical properties, 193 nm litho, plasma etch rates, Prolith modeling data, spin-bowl and waste line compatibility, and ambient stability.

Citation Download Citation

James D. Meador, Douglas J. Guerrero, Gu Xu, Xie Shao, Norman Dobson, James B. Claypool, and Kelly A. Nowak "Recent progress in 193-nm antireflective coatings", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350269

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