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26 July 1999 High-repetition-rate excimer lasers for DUV lithography
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Abstract
With the transition of DUV lithography into mass production, the economics of the excimer laser light sources is getting more important. The efforts in the development are directed towards an increase of the laser's repetition rate and output power for higher wafer throughput and an improvement of the component lifetime in order to reduce the cost of laser operation. Here we describe advanced 248 nm and 193 nm laser systems which operate with repetition rates of 2 kHz to be used in conjunction with refractive, partially achromatic refractive and catadioptric lithographic lenses, respectively.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Uwe Stamm, Rainer Paetzel, Igor Bragin, Vincent Berger, Ingo Klaft, Juergen Kleinschmidt, Rustem Osmanov, Thomas Schroeder, Klaus Vogler, Wolfgang Zschocke, and Dirk Basting "High-repetition-rate excimer lasers for DUV lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354310
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