Line-narrowed ArF excimer laser for 193-nm lithography

Takashi Saito; Ken-ichi Mitsuhashi; Motohiro Arai; Kyouhei Seki; Akifumi Tada; Tatsushi Igarashi; Kazuaki Hotta

doi:10.1117/12.354312

26 July 1999 Line-narrowed ArF excimer laser for 193-nm lithography

Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Kyouhei Seki, Akifumi Tada, Tatsushi Igarashi, Kazuaki Hotta

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354312
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Recently, considerable progress has been made in the development of ArF excimer lasers for 193 nm lithography. A line-narrowed ArF excimer laser with a bandwidth of < 0.7 pm can be used with a refractive lens system. In this paper, we present a line-narrowed ArF excimer laser which we have developed for 193 nm lithography. This laser produces an output power of over 5 W with a 0.6 pm FWHM bandwidth at 1 kHz operation.

Citation Download Citation

Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Kyouhei Seki, Akifumi Tada, Tatsushi Igarashi, and Kazuaki Hotta "Line-narrowed ArF excimer laser for 193-nm lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354312

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available